Lithography/Patterning Strategies for an Industry in Flux

EUVL is increasingly being used for high-volume manufacturing (HVM) by manufacturers of logic ICs and foundries, while memory manufacturers are working to insert it into the HVM of DRAM. Much effort is also being put into developing high-NA EUV exposure tools to enable the industry to extend Moore’s law for a number of years to come. As always, development activities must always take into account cost-effectiveness and other patterning strategies may be useful. This session will provide an update on the status of EUVL (including the EUV ecosystem) for HVM, other cost-effective patterning strategies, and the R&D activities needed to pursue them.